Chemical Mechanical Polishing

Ukupolishwa kweekhemikhali (i-CMP) kudla ngokubandakanyeka ekuveliseni iindawo ezigudileyo nge-chemical reaction, ingakumbi imisebenzi kwishishini lokuvelisa ii-semiconductor.ILonnmeter, umqambi othembekileyo onamava angaphezu kweminyaka engama-20 ekulinganiseni uxinaniso olungaphakathi, unikezela ngobuchule obuphezuluiimitha zoxinano olungelulo lwenyukliyakunye nee-viscosity sensors ukujongana nemingeni yolawulo lwe-slurry.

Ukubaluleka koMgangatho weSlurry kunye noBuchule beLonnmeter

I-slurry ye-chemical mechanical polishing yintsika yenkqubo ye-CMP, echaza ukufana kunye nomgangatho weendawo. Uxinano lwe-slurry olungaguquguqukiyo okanye i-viscosity inokukhokelela kwiziphene ezifana nokukrweleka okuncinci, ukususwa kwezinto ezingalinganiyo, okanye ukuvaleka kwephedi, okubeka emngciphekweni umgangatho we-wafer kunye nokunyusa iindleko zemveliso. I-Lonnmeter, inkokeli yehlabathi kwizisombululo zokulinganisa imboni, igxile ekulinganisweni kwe-slurry ngaphakathi ukuqinisekisa ukusebenza kwe-slurry efanelekileyo. Ngerekhodi eliqinisekisiweyo lokubonelela ngee-sensors ezinokuthenjwa nezichanekileyo, i-Lonnmeter isebenzisana nabavelisi be-semiconductor abaphambili ukuphucula ulawulo lwenkqubo kunye nokusebenza kakuhle. Iimitha zabo zoxinano lwe-slurry ezingezizo zenyukliya kunye nee-viscosity sensors zibonelela ngedatha yexesha langempela, zivumela uhlengahlengiso oluchanekileyo ukugcina ukuhambelana kwe-slurry kunye nokuhlangabezana neemfuno ezingqongqo zemveliso ye-semiconductor yanamhlanje.

Amava angaphezu kwamashumi amabini eminyaka ekulinganisweni koxinzelelo olungaphakathi, oluthenjwa ziinkampani eziphambili ze-semiconductor. Izinzwa zeLonnmeter zenzelwe ukuhlanganiswa okungenamthungo kwaye zingagcini, zinciphisa iindleko zokusebenza. Izisombululo ezenzelwe ukuhlangabezana neemfuno ezithile zenkqubo, ukuqinisekisa isivuno esiphezulu se-wafer kunye nokuthobela imithetho.

Indima yokuCoca iiKhemikhali kwiMveliso yeSemiconductor

Ukupolishwa koomatshini bekhemikhali (i-CMP), okubizwa ngokuba yi-chemical-mechanical planarization, lilitye lesiseko lokwenziwa kwe-semiconductor, okuvumela ukudalwa kweendawo ezithe tyaba, ezingenaziphene zokuvelisa iitshiphusi eziphambili. Ngokudibanisa ukukrola kweekhemikhali kunye nokukrala koomatshini, inkqubo ye-CMP iqinisekisa ukuchaneka okufunekayo kwiisekethe ezidibeneyo ezineeleya ezininzi kwiindawo ezingaphantsi kwe-10nm. I-slurry yokupolishwa koomatshini bekhemikhali, eyenziwe ngamanzi, ii-reagents zeekhemikhali, kunye namaqhekeza abrasive, isebenzisana ne-polishing pad kunye ne-wafer ukususa izinto ngokufanayo. Njengoko uyilo lwe-semiconductor lutshintsha, inkqubo ye-CMP ijongene nobunzima obukhulayo, ifuna ulawulo oluqinileyo kwiipropati ze-slurry ukuthintela iziphene kunye nokufezekisa ii-wafers ezigudileyo nezicociweyo ezifunwa yi-Semiconductor Foundries and Materials Suppliers.

Le nkqubo ibalulekile ekuveliseni iitships ze-5nm kunye ne-3nm ezineziphene ezincinci, nto leyo eqinisekisa ukuba iindawo ezithe tyaba ziyagcinwa ngokuchanekileyo kwiileya ezilandelayo. Nokuba ukungangqinelani okuncinci kwe-slurry kunokukhokelela ekusetyenzisweni kwakhona okubiza kakhulu okanye ekulahlekelweni yimveliso.

Imingeni ekujongeni iipropati zeSlurry

Ukugcina uxinano oluhambelanayo lwe-slurry kunye ne-viscosity kwinkqubo yokupholisha ngoomatshini beekhemikhali kugcwele imingeni. Iimpawu ze-slurry zingahluka ngenxa yezinto ezifana nokuthuthwa, ukuxutywa ngamanzi okanye i-hydrogen peroxide, ukuxubana okunganelanga, okanye ukuwohloka kweekhemikhali. Umzekelo, ukuhlala kwee-particle kwi-slurry totes kunokubangela uxinano oluphezulu ezantsi, okukhokelela ekupholiseni okungafanelaniyo. Iindlela zokujonga zemveli ezifana ne-pH, i-oxidation-reduction potential (ORP), okanye i-conductivity zihlala zinganeli, njengoko zisilela ukubona utshintsho oluncinci kulwakhiwo lwe-slurry. Ezi mingcele zinokubangela iziphene, amazinga okususwa ancitshisiweyo, kunye neendleko ezithengiswayo ezikhulayo, nto leyo ebeka umngcipheko omkhulu kubavelisi bezixhobo ze-semiconductor kunye nababoneleli beenkonzo ze-CMP. Utshintsho lolwakhiwo ngexesha lokuphatha nokuhambisa luchaphazela ukusebenza. Ii-sub-10nm nodes zifuna ulawulo oluqinileyo phezu kobunyulu be-slurry kunye nokuchaneka komxube. I-pH kunye ne-ORP zibonisa umahluko omncinci, ngelixa i-conductivity iyahluka ngokuguga kwe-slurry. Iimpawu ze-slurry ezingahambelaniyo zinokunyusa amazinga eziphene ukuya kuthi ga kwi-20%, ngokwezifundo zomzi-mveliso.

IiSensors zeLonnmeter ezikwi-Inline zokujonga ngexesha langempela

I-Lonnmeter ijongana nale mingeni ngeemitha zayo zoxinano lwe-slurry ezingezizo ezenyukliya eziphucukileyo kunyeizinzwa ze-viscosity, kuquka imitha ye-viscosity emgceni wokulinganisa i-viscosity emgceni kunye nemitha ye-ultrasonic density yokujonga i-slurry density kunye ne-viscosity ngaxeshanye. Ezi sensors zenzelwe ukuhlanganiswa okungenamthungo kwiinkqubo ze-CMP, eziquka uqhagamshelo olusemgangathweni weshishini. Izisombululo zeLonnmeter zibonelela ngokuthembeka kwexesha elide kunye nokugcinwa okuncinci kolwakhiwo lwayo oluqinileyo. Idatha yexesha langempela ivumela abaqhubi ukuba balungise imixube ye-slurry, bathintele iziphene, kwaye baphucule ukusebenza kwe-polish, okwenza ezi zixhobo zibe yimfuneko kuBaboneleli beZixhobo zoHlahlelo kunye noVavanyo kunye nabaNiki beCMP Consumables.

Iingenelo zokuBeka esweni rhoqo ukuze kuphuculwe i-CMP

Ukubeka iliso rhoqo ngee-sensors ze-Lonnmeter ezikwi-inline kuguqula inkqubo yokupholisha ngoomatshini bekhemikhali ngokubonelela ngengqiqo enokwenzeka kunye nokonga iindleko ezibalulekileyo. Ukulinganiswa koxinano lwe-slurry ngexesha langempela kunye nokubeka iliso kwi-viscosity kunciphisa iziphene ezifana nokukrwela okanye ukupholisha kakhulu ukuya kuthi ga kwi-20%, ngokwemigangatho yoshishino. Ukuhlanganiswa nenkqubo ye-PLC kwenza ukuba idosi ikwazi ukwenziwa ngokuzenzekelayo kunye nolawulo lwenkqubo, ukuqinisekisa ukuba iipropati ze-slurry zihlala ngaphakathi koluhlu olufanelekileyo. Oku kukhokelela ekunciphiseni kwe-15-25% kwiindleko ezisetyenziswayo, ukunciphisa ixesha lokungasebenzi, kunye nokuphucula ukufana kwe-wafer. Kwi-Semiconductor Foundries kunye nababoneleli ngeeNkonzo ze-CMP, ezi zibonelelo ziguqulela ekuveliseni okuphuculweyo, imida ephezulu yenzuzo, kunye nokuthobela imigangatho efana ne-ISO 6976.

Imibuzo Eqhelekileyo Malunga Nokujongwa Kokulunywa Kwesiluli kwi-CMP

Kutheni ukulinganiswa koxinano lwe-slurry kubalulekile kwi-CMP?

Ukulinganiswa koxinano lwe-slurry kuqinisekisa ukusasazwa kweesuntswana ezifanayo kunye nokuhambelana komxube, kuthintela iziphene kunye nokwenza ngcono amazinga okususa kwinkqubo yokupholisha ngoomatshini beekhemikhali. Ixhasa ukuveliswa kwe-wafer esemgangathweni ophezulu kunye nokuthobela imigangatho yoshishino.

Ukubeka iliso kwi-viscosity kuphucula njani ukusebenza kakuhle kwe-CMP?

Ukubeka iliso kwi-viscosity kugcina ukuhamba kodaka rhoqo, kuthintela iingxaki ezifana nokuvaleka kwephedi okanye ukupholisha okungalinganiyo. Iisensa ze-inline zeLonnmeter zibonelela ngedatha yexesha langempela ukuze kuphuculwe inkqubo ye-CMP kwaye kuphuculwe isivuno se-wafer.

Yintoni eyenza iimitha zoxinano lwe-slurry ezingezizo ezenyukliya zaseLonnmeter zahluke?

Iimitha zoxinano lwe-slurry ezingezizo zenyukliya zaseLonnmeter zibonelela ngokulinganisa uxinano kunye ne-viscosity ngaxeshanye ngokuchanekileyo okuphezulu kwaye azigcinwa. Uyilo lwazo oluqinileyo luqinisekisa ukuthembeka kwiindawo ezifuna kakhulu inkqubo ye-CMP.

Ukulinganiswa koxinano lwe-slurry ngexesha langempela kunye nokubeka iliso kwi-viscosity kubalulekile ekwenzeni ngcono inkqubo yokupholisha ngoomatshini beekhemikhali kwimveliso ye-semiconductor. Iimitha zoxinano lwe-slurry ezingezizo zenyukliya kunye nee-sensors ze-viscosity zeLonnmeter zibonelela abavelisi bezixhobo ze-Semiconductor, ababoneleli be-CMP Consumables, kunye ne-Semiconductor Foundries ngezixhobo zokoyisa imingeni yolawulo lwe-slurry, ukunciphisa iziphene, kunye neendleko eziphantsi. Ngokunikezela ngedatha echanekileyo, yexesha langempela, ezi zisombululo ziphucula ukusebenza kakuhle kwenkqubo, ziqinisekisa ukuthotyelwa kwemithetho, kwaye ziqhuba inzuzo kwimarike yokhuphiswano lwe-CMP. NdwendwelaIwebhusayithi yaseLonnmeterokanye uqhagamshelane neqela labo namhlanje ukuze ufumane indlela iLonnmeter enokutshintsha ngayo imisebenzi yakho yokupholisha ngoomatshini beekhemikhali.

Thatha Inyathelo Ngoku

Ixesha leposi: Julayi-22-2025