Kev Txhuam Txhuam Tshuaj

Cov Teeb Meem Hauv Kev Saib Xyuas Cov Khoom Siv Slurry

Kev tswj kom cov slurry ceev thiab viscosity sib xws hauv cov txheej txheem polishing tshuaj lom neeg yog fraught nrog cov teeb meem. Cov khoom slurry tuaj yeem sib txawv vim yog cov yam xws li kev thauj mus los, dilution nrog dej lossis hydrogen peroxide, tsis sib tov, lossis tshuaj lom neeg degradation. Piv txwv li, cov khoom me me hauv cov slurry totes tuaj yeem ua rau muaj qhov ceev ntau dua ntawm qab, ua rau tsis sib xws polishing. Cov txheej txheem saib xyuas ib txwm muaj xws li pH, oxidation-reduction potential (ORP), lossis conductivity feem ntau tsis txaus, vim lawv tsis pom cov kev hloov pauv me me hauv cov slurry composition. Cov kev txwv no tuaj yeem ua rau muaj qhov tsis zoo, txo cov nqi tshem tawm, thiab nce cov nqi siv khoom, ua rau muaj kev pheej hmoo loj rau cov tuam txhab tsim khoom siv semiconductor thiab cov neeg muab kev pabcuam CMP. Kev hloov pauv ntawm cov khoom thaum lub sijhawm tuav thiab faib khoom cuam tshuam rau kev ua tau zoo. Sub-10nm nodes xav tau kev tswj hwm nruj dua ntawm slurry purity thiab kev sib xyaw kom raug. pH thiab ORP qhia qhov sib txawv me me, thaum conductivity sib txawv nrog slurry laus. Cov khoom slurry tsis sib xws tuaj yeem ua rau cov nqi tsis zoo nce txog li 20%, ib qho kev tshawb fawb kev lag luam.

Lonnmeter's Inline Sensors rau Kev Saib Xyuas Lub Sijhawm Tiag Tiag

Lonnmeter daws cov teeb meem no nrog nws cov ntsuas ceev ceev uas tsis yog nuclear thiabcov ntsuas viscosity, suav nrog viscosity meter inline rau kev ntsuas viscosity hauv-kab thiab lub ultrasonic density meter rau kev soj ntsuam slurry density thiab viscosity tib lub sijhawm. Cov sensors no yog tsim los rau kev sib koom ua ke seamless rau hauv CMP cov txheej txheem, muaj kev sib txuas hauv kev lag luam. Lonnmeter cov kev daws teeb meem muab kev ntseeg siab mus sij hawm ntev thiab kev saib xyuas tsawg rau nws txoj kev tsim kho ruaj khov. Cov ntaub ntawv tiag tiag ua rau cov neeg teb xov tooj tuaj yeem kho cov slurry blends, tiv thaiv qhov tsis zoo, thiab ua kom zoo dua kev ua haujlwm polishing, ua rau cov cuab yeej no tsis tseem ceeb rau Kev Tshuaj Xyuas thiab Kev Ntsuas Cov Khoom Siv thiab CMP Cov Neeg Muag Khoom Siv.

Cov txiaj ntsig ntawm kev saib xyuas tas mus li rau kev txhim kho CMP

Kev soj ntsuam tas mus li nrog Lonnmeter's inline sensors hloov pauv cov txheej txheem polishing tshuaj lom neeg los ntawm kev xa cov kev nkag siab ua tau thiab txuag tau nyiaj ntau. Kev ntsuas qhov ceev ntawm slurry thiab kev soj ntsuam viscosity tiag tiag txo cov qhov tsis zoo xws li khawb lossis polishing ntau dhau txog li 20%, raws li cov qauv kev lag luam. Kev koom ua ke nrog PLC system ua rau kev ntsuas tshuaj thiab kev tswj cov txheej txheem tsis siv neeg, ua kom cov khoom slurry nyob hauv qhov zoo tshaj plaws. Qhov no ua rau 15-25% txo cov nqi siv, txo qis lub sijhawm tsis ua haujlwm, thiab txhim kho wafer uniformity. Rau Semiconductor Foundries thiab CMP Services Providers, cov txiaj ntsig no txhais tau tias muaj kev tsim khoom zoo dua, cov nyiaj tau los ntau dua, thiab ua raws li cov qauv zoo li ISO 6976.